Phosphorous Oxychloride

Phosphorus Oxychloride (POCl3) is a versatile chemical compound with various applications in different industries. At Ace Gases, we offer high-quality POCl3 and related services to meet the specific needs of our customers.

These applications of POCl3 in the semiconductor and electronics industry are vital for the fabrication of integrated circuits, transistors, diodes, and other electronic components. By utilizing POCl3, manufacturers can achieve precise doping, controlled oxide growth, and accurate etching, ultimately contributing to the production of high-performance and reliable semiconductor devices.

POCl3 is widely used in the pharmaceutical industry for synthesizing pharmaceutical intermediates and active ingredients. It enhances soil fertility in agriculture and acts as a catalyst in polymer manufacturing, creating high-performance materials. Additionally, POCl3 is crucial in producing specialty chemicals like plasticizers, surfactants, and dyes, serving as a versatile building block in chemical synthesis.

At Ace Gases, we prioritize safety, quality, and reliability in providing POCl3 and related solutions. Our experienced team ensures strict adherence to safety standards, and we offer a range of packaging options tailored to meet the specific requirements of different industries. Contact Ace Gases to explore how our POCl3 solutions can meet your industry needs and contribute to your success.


Dopant Source

POCl3 is used as a dopant source for introducing phosphorus atoms into silicon wafers during the manufacturing of n-type (negative) doped regions in semiconductors.

Diffusion Process

POCl3 is employed in the diffusion process, where it is used as a source of phosphorus atoms for creating highly controlled and precise doping profiles in silicon substrates.

Oxide Growth

POCl3 is utilized in the growth of silicon dioxide (SiO2) films through the process of chemical vapor deposition (CVD).

Etching Agent

POCl3 can be employed as an etching agent in certain selective etching processes.